Invention Grant
- Patent Title: Oxygen-doped group III metal nitride and method of manufacture
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Application No.: US15865391Application Date: 2018-01-09
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Publication No.: US10648102B2Publication Date: 2020-05-12
- Inventor: Wenkan Jiang , Dirk Ehrentraut , Mark P. D'Evelyn
- Applicant: SLT TECHNOLOGIES, INC.
- Applicant Address: US CA Los Angeles
- Assignee: SLT TECHNOLOGIES, INC.
- Current Assignee: SLT TECHNOLOGIES, INC.
- Current Assignee Address: US CA Los Angeles
- Agency: Patterson & Sheridan, LLP
- Main IPC: C30B29/40
- IPC: C30B29/40 ; C01B21/06 ; H01L29/20 ; H01L29/30 ; C30B7/10

Abstract:
Gallium-containing nitride crystals are disclosed, comprising: a top surface having a crystallographic orientation within about 5 degrees of a plane selected from a (0001) +c-plane and a (000-1) −c-plane; a substantially wurtzite structure; n-type electronic properties; an impurity concentration of hydrogen greater than about 5×1017 cm−3; an impurity concentration of oxygen between about 2×1017 cm−3 and about 1×1020 cm−3; an [H]/[O] ratio of at least 0.3; an impurity concentration of at least one of Li, Na, K, Rb, Cs, Ca, F, and CI greater than about 1×1016 cm−3; a compensation ratio between about 1.0 and about 4.0; an absorbance per unit thickness of at least 0.01 cm−1 at wavenumbers of approximately 3175 cm−1, 3164 cm−1, and 3150 cm−1; and wherein, at wavenumbers between about 3200 cm−1 and about 3400 cm−1 and between about 3075 cm−1 and about 3125 cm−1, said gallium-containing nitride crystal is essentially free of infrared absorption peaks having an absorbance per unit thickness greater than 10% of the absorbance per unit thickness at 3175 cm−1.
Public/Granted literature
- US20180195206A1 OXYGEN-DOPED GROUP III METAL NITRIDE AND METHOD OF MANUFACTURE Public/Granted day:2018-07-12
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