Invention Grant
- Patent Title: Liquid processing apparatus
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Application No.: US16100609Application Date: 2018-08-10
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Publication No.: US10649334B2Publication Date: 2020-05-12
- Inventor: Koki Yoshimura , Shogo Takahasi , Yasushi Takiguchi , Taro Yamamoto
- Applicant: Tokyo Electron Limited
- Applicant Address: JP
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP
- Agency: Abelman, Frayne & Schwab
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@525beb6c
- Main IPC: G03F7/16
- IPC: G03F7/16 ; H01L21/67 ; G03F7/30 ; H01L21/683

Abstract:
Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.
Public/Granted literature
- US20190049845A1 LIQUID PROCESSING APPARATUS Public/Granted day:2019-02-14
Information query
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