Invention Grant
- Patent Title: Isolated wells for resistor devices
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Application No.: US15646962Application Date: 2017-07-11
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Publication No.: US10651170B2Publication Date: 2020-05-12
- Inventor: Yu-Lung Tung , Min-Chang Liang , Fang Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L27/08
- IPC: H01L27/08 ; H01L27/12 ; H01L29/06 ; H01L49/02 ; H01L21/84 ; H01L21/761 ; G06F17/50 ; H01L21/762

Abstract:
A semiconductor device includes a substrate, a dielectric layer over the substrate, a first resistor element embedded within the dielectric layer, a second resistor element embedded within the dielectric layer, a first doped well within the substrate, the first doped well being aligned with the first resistor element, and a second doped well within the substrate, the second doped well being aligned with the second resistor element, the second doped well being non-contiguous with the first doped well.
Public/Granted literature
- US20190019791A1 Isolated Wells For Resistor Devices Public/Granted day:2019-01-17
Information query
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