Invention Grant
- Patent Title: Nitride fluorescent material, method for producing the same, and light emitting device
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Application No.: US15916938Application Date: 2018-03-09
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Publication No.: US10662375B2Publication Date: 2020-05-26
- Inventor: Kazuya Nishimata , Hiroyuki Watanabe , Shoji Hosokawa
- Applicant: NICHIA CORPORATION
- Applicant Address: JP Anan-shi
- Assignee: NICHIA CORPORATION
- Current Assignee: NICHIA CORPORATION
- Current Assignee Address: JP Anan-shi
- Agency: Hunton Andrews Kurth LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4807448a com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4c910d7d
- Main IPC: H01L33/50
- IPC: H01L33/50 ; H01L33/32 ; H01L33/48 ; H01L33/56 ; H01L33/62 ; C09K11/77 ; C09K11/08
Abstract:
A method for producing a nitride fluorescent material having high emission luminance can be provided. The method includes heat-treating a raw material mixture containing silicon nitride, silicon, an aluminium compound, a calcium compound, and a europium compound.
Public/Granted literature
- US20180194999A1 NITRIDE FLUORESCENT MATERIAL, METHOD FOR PRODUCING THE SAME, AND LIGHT EMITTING DEVICE Public/Granted day:2018-07-12
Information query
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