Invention Grant
- Patent Title: Placing table and plasma treatment apparatus
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Application No.: US15308686Application Date: 2015-06-01
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Publication No.: US10679869B2Publication Date: 2020-06-09
- Inventor: Dai Kitagawa , Katsuyuki Koizumi , Tsutomu Nagai , Daisuke Hayashi , Satoru Teruuchi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4ca702a1
- International Application: PCT/JP2015/065738 WO 20150601
- International Announcement: WO2015/190333 WO 20151217
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01J37/32 ; H01L21/683
Abstract:
A placing table on an embodiment includes a supporting member and a base. The supporting member includes a placing region provided with a heater, and an outer peripheral region surrounding the placing region. The base includes a first region supporting the placing region thereon, and a second region surrounding the first region. In the second region, through holes are formed. Wirings electrically connected to the heater passes through the through holes of the second region.
Public/Granted literature
- US20170140954A1 PLACING TABLE AND PLASMA TREATMENT APPARATUS Public/Granted day:2017-05-18
Information query
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