Invention Grant
- Patent Title: Photo-patternable gate dielectrics for OFET
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Application No.: US16223645Application Date: 2018-12-18
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Publication No.: US10680192B2Publication Date: 2020-06-09
- Inventor: Robert Alan Bellman , Mingqian He , Timothy Edward Myers , Weijun Niu , David Neal Schissel , Kristi Lynn Simonton , Arthur Lawrence Wallace
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L51/10 ; H01L51/00
Abstract:
Articles utilizing polymeric dielectric materials for gate dielectrics and insulator materials are provided along with methods for making the articles. The articles are useful in electronics-based devices that utilize organic thin film transistors.
Public/Granted literature
- US20190115548A1 PHOTO-PATTERNABLE GATE DIELECTRICS FOR OFET Public/Granted day:2019-04-18
Information query
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