发明授权
- 专利标题: Photodetector
-
申请号: US15751795申请日: 2016-08-28
-
公开(公告)号: US10720543B2公开(公告)日: 2020-07-21
- 发明人: Hiroshi Fukuda , Shin Kamei , Ken Tsuzuki , Makoto Jizodo , Kiyofumi Kikuchi
- 申请人: Nippon Telegraph and Telephone Corporation
- 申请人地址: JP Tokyo
- 专利权人: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- 当前专利权人: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Workman Nydegger
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@75d235f1
- 国际申请: PCT/JP2016/003907 WO 20160828
- 国际公布: WO2017/038072 WO 20170309
- 主分类号: H01L31/102
- IPC分类号: H01L31/102 ; H01L31/105 ; H01L31/0224 ; H01L31/0352 ; H01L31/028 ; H01L31/0232 ; H01L31/0264
摘要:
A germanium photodetector which reduces a dark current without degradation of a photocurrent includes: a silicon substrate; a lower clad layer formed on the silicon substrate; a core layer formed on the lower clad layer; a p-type silicon slab formed in a part of the core layer and doped with a p-type impurity ion; p++ silicon electrode sections that are highly-doped with a p-type impurity and act as an electrode; and germanium layers which absorb light. The germanium photodetector further includes an upper clad layer, an n-type germanium region doped with an n-type impurity above the germanium layer, and an electrode. According to the present invention, two germanium layers are provided on the p-type silicon slab so as to miniaturize the area of the surface of the individual germanium layer in contact with the p-type silicon slab, so that the dark current due to threading dislocation can be reduced.
公开/授权文献
- US20180233618A1 PHOTODETECTOR 公开/授权日:2018-08-16
信息查询
IPC分类: