Invention Grant
- Patent Title: Compound, resin, resist composition and method for producing resist pattern
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Application No.: US14835102Application Date: 2015-08-25
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Publication No.: US10725380B2Publication Date: 2020-07-28
- Inventor: Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5799f145 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@78ad344
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F214/18 ; G03F7/38 ; G03F7/039 ; C08F122/10 ; G03F7/32 ; C08F122/18 ; C07C69/757 ; C08F218/00

Abstract:
A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *—A3—X1—(A4—X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O—or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.
Public/Granted literature
- US20160052860A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-02-25
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