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公开(公告)号：US11366387B2
公开(公告)日：2022-06-21
申请号：US16527271
申请日：2019-07-31
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Takahiro Yasue , Koji Ichikawa
Abstract: Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2), L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, A1 represents a divalent alicyclic hydrocarbon group which may have a substituent, Ra represents a cyclic hydrocarbon group which may have a substituent, and Z+ represents an organic cation.
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公开(公告)号：US11198748B2
公开(公告)日：2021-12-14
申请号：US16465245
申请日：2017-12-07
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Satoshi Yamaguchi , Koji Ichikawa
IPC: C08F220/26 , C08F212/14 , G03F7/004 , G03F7/039 , G03F7/20 , C08F220/02 , C08F220/28
Abstract: Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group: wherein R1 represents a hydrocarbon group which may have a substituent, R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (L1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, etc., * and ** are bonds, and ** represents a bond to an iodine atom.
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公开(公告)号：US10725380B2
公开(公告)日：2020-07-28
申请号：US14835102
申请日：2015-08-25
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC: G03F7/004 , C08F214/18 , G03F7/38 , G03F7/039 , C08F122/10 , G03F7/32 , C08F122/18 , C07C69/757 , C08F218/00
Abstract: A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *—A3—X1—(A4—X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O—or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.
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公开(公告)号：US10670963B2
公开(公告)日：2020-06-02
申请号：US15911804
申请日：2018-03-05
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Satoshi Yamaguchi , Koji Ichikawa
IPC: G03F7/004 , G03F7/38 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/17 , C07C309/19 , C07C381/12 , C07D317/16 , C07D317/24 , C07D317/26 , C07D319/04 , C07D319/06 , C07D319/08 , C07C321/28 , G03F7/038 , G03F7/32 , G03F7/16 , G03F7/20 , G03F7/039
Abstract: A salt represented by the formula (I). wherein Z+, Q1, Q2, R1, R2, R3, R4, R5, Z, X1, X2, Xa, Xb, L1, L2, L3 and L4 are defined in the specification.
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公开(公告)号：US10209618B2
公开(公告)日：2019-02-19
申请号：US15591266
申请日：2017-05-10
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Koji Ichikawa
Abstract: A photoresist composition comprising an acid generator and a resin which comprises a structural unit having an acid-liable group, the acid generator generating an acid (I) or an acid (II): the acid (I) showing a hydrogen bonding parameter in the range of 12 (MPa)1/2 to 15 (MPa)1/2 and a polarity parameter in the range of 15 (MPa)1/2 or more; the acid (II) showing a hydrogen bonding parameter in the range of 12 (MPa)1/2 to 15 (MPa)1/2, and a distance of Hansen solubility parameters between the acid (II) and γ-butyrolactone being 7.5 or less, and the distance being calculated from formula (1): R=(4×(δdA−18)2+(δpA−16.6)2+(δhA−7.4)2)1/2 (1) in which δdA represents a dispersion parameter of an acid, δpA represents a polarity parameter of an acid, δhA represents a hydrogen bonding parameter of an acid, and R represents a distance of Hansen solubility parameters between an acid and γ-butyrolactone.
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Patent Agency Ranking
公开(公告)号：US09612533B2
公开(公告)日：2017-04-04
申请号：US14601895
申请日：2015-01-21
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Koji Ichikawa , Satoshi Yamamoto
IPC: G03F7/004 , C07C43/12 , C07C381/12 , G03F7/039
CPC classification number: G03F7/0045 , C07C43/12 , G03F7/0046 , G03F7/0397
Abstract: A salt which generates an acid by light irradiation, said salt comprising:an acid-labile group having an acetal structure from which group a moiety having a fluorine-containing base-labile group is removed by bring into contact with the acid.
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7.发明授权Photoresist composition, compound and process of producing photoresist pattern 有权光致抗蚀剂组合物，复合物和制造光致抗蚀剂图案的工艺公开(公告)号：US09563123B2
公开(公告)日：2017-02-07
申请号：US14635718
申请日：2015-03-02
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Shingo Fujita , Koji Ichikawa
IPC: G03F7/004 , G03F7/039 , G03F7/38 , C07D321/10 , C07C71/00
CPC classification number: G03F7/0392 , C07C71/00 , C07C2601/14 , C07C2603/74 , C07D321/10 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/38
Abstract: A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
Abstract translation: 1.一种光致抗蚀剂组合物，其含有：具有酸不稳定基团的树脂，酸产生剂和式（I）表示的化合物：其中，R 1，R 2和R 3各自独立地表示可以具有氢原子的C 1 -C 24烃基 由取代基取代，其中亚甲基可被氧原子，硫原子或羰基取代。
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公开(公告)号：US09562032B2
公开(公告)日：2017-02-07
申请号：US14601825
申请日：2015-01-21
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Koji Ichikawa , Masafumi Yoshida
IPC: C07D317/72 , C07D319/08 , C07D327/04 , C07D327/06 , G03F7/039 , G03F7/20 , C07C381/12 , G03F7/004
CPC classification number: C07D317/72 , C07C381/12 , C07D319/08 , C07D327/06 , G03F7/0045 , G03F7/0046 , G03F7/0397
Abstract: A salt which has a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur group; X1 represents a C1-C12 divalent saturated hydrocarbon group which has a hydroxy group; and * represents a binding site.
Abstract translation: 具有由式（a）表示的基团的盐：其中Xa和Xb各自独立地表示氧原子或硫基; X1表示具有羟基的C1-C12二价饱和烃基; 和*表示结合位点。
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公开(公告)号：US11474431B2
公开(公告)日：2022-10-18
申请号：US16014836
申请日：2018-06-21
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Katsuhiro Komuro , Koji Ichikawa
Abstract: A compound represented by the formula (I):
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公开(公告)号：US11467490B2
公开(公告)日：2022-10-11
申请号：US17166303
申请日：2021-02-03
Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
Inventor： Tatsuro Masuyama , Yukako Anryu , Koji Ichikawa
IPC: G03F7/004 , C08F212/14 , C08F220/18 , C07C309/06 , C07C309/17 , C07C381/12 , C07D307/00 , C07D321/10 , C07D327/04
Abstract: Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.
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