- 专利标题: Measurement library optimization in semiconductor metrology
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申请号: US16417085申请日: 2019-05-20
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公开(公告)号: US10732520B1公开(公告)日: 2020-08-04
- 发明人: Meng Cao , Lie-Quan Lee , Qiang Zhao , Heyin Li , Mengmeng Ye
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA Tencor Corporation
- 当前专利权人: KLA Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Spano Law Group
- 代理商 Joseph S. Spano
- 主分类号: G06F9/00
- IPC分类号: G06F9/00 ; G03F9/00
摘要:
Methods and systems for optimizing a set of measurement library control parameters for a particular metrology application are presented herein. Measurement signals are collected from one or more metrology targets by a target measurement system. Values of user selected parameters of interest are resolved by fitting a pre-computed measurement library function to the measurement signals for a given set of library control parameters. Values of one or more library control parameters are optimized such that differences between the values of the parameters of interest estimated by the library based measurement and reference values associated with trusted measurements of the parameters of interest are minimized. The optimization of the library control parameter values is performed without recalculating the pre-computed measurement library. Subsequent library based measurements are performed by the target measurement system using the optimized set of measurement library control parameters with improved measurement performance.
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