Measurement library optimization in semiconductor metrology

    公开(公告)号:US10732520B1

    公开(公告)日:2020-08-04

    申请号:US16417085

    申请日:2019-05-20

    IPC分类号: G06F9/00 G03F9/00

    摘要: Methods and systems for optimizing a set of measurement library control parameters for a particular metrology application are presented herein. Measurement signals are collected from one or more metrology targets by a target measurement system. Values of user selected parameters of interest are resolved by fitting a pre-computed measurement library function to the measurement signals for a given set of library control parameters. Values of one or more library control parameters are optimized such that differences between the values of the parameters of interest estimated by the library based measurement and reference values associated with trusted measurements of the parameters of interest are minimized. The optimization of the library control parameter values is performed without recalculating the pre-computed measurement library. Subsequent library based measurements are performed by the target measurement system using the optimized set of measurement library control parameters with improved measurement performance.

    Measurement library optimization in semiconductor metrology

    公开(公告)号:US10345721B1

    公开(公告)日:2019-07-09

    申请号:US15184782

    申请日:2016-06-16

    IPC分类号: G03F9/00

    摘要: Methods and systems for optimizing a set of measurement library control parameters for a particular metrology application are presented herein. Measurement signals are collected from one or more metrology targets by a target measurement system. Values of user selected parameters of interest are resolved by fitting a pre-computed measurement library function to the measurement signals for a given set of library control parameters. Values of one or more library control parameters are optimized such that differences between the values of the parameters of interest estimated by the library based measurement and reference values associated with trusted measurements of the parameters of interest are minimized. The optimization of the library control parameter values is performed without recalculating the pre-computed measurement library. Subsequent library based measurements are performed by the target measurement system using the optimized set of measurement library control parameters with improved measurement performance.

    Automated Metrology System Selection
    3.
    发明申请
    Automated Metrology System Selection 审中-公开
    自动计量系统选择

    公开(公告)号:US20170023491A1

    公开(公告)日:2017-01-26

    申请号:US15166897

    申请日:2016-05-27

    IPC分类号: G01N21/95

    摘要: Methods and systems for evaluating and ranking the measurement efficacy of multiple sets of measurement system combinations and recipes for a particular metrology application are presented herein. Measurement efficacy is based on estimates of measurement precision, measurement accuracy, correlation to a reference measurement, measurement time, or any combination thereof. The automated the selection of measurement system combinations and recipes reduces time to measurement and improves measurement results. Measurement efficacy is quantified by a set of measurement performance metrics associated with each measurement system and recipe. In one example, the sets of measurement system combinations and recipes most capable of measuring the desired parameter of interest are presented to the user in rank order based on corresponding values of one or more measurement performance metrics. A user is able to select the appropriate measurement system combination in an objective, quantitative manner.

    摘要翻译: 本文介绍了用于评估和评估特定测量应用的多组测量系统组合和配方的测量功能的方法和系统。 测量功效基于测量精度,测量精度,与参考测量的相关性,测量时间或其任何组合的估计。 自动化测量系统组合和配方的选择减少了测量时间并提高了测量结果。 通过与每个测量系统和配方相关联的一组测量性能指标量化测量功效。 在一个示例中,基于一个或多个测量性能度量的对应值,以等级顺序向用户呈现最能测量所需感兴趣参数的测量系统组合和配方的集合。 用户能够以客观,定量的方式选择合适的测量系统组合。