- 专利标题: Method for producing a wafer from a hexagonal single crystal ingot by applying a laser beam to form a first production history, an exfoliation layer, and a second production history
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申请号: US16192250申请日: 2018-11-15
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公开(公告)号: US10755946B2公开(公告)日: 2020-08-25
- 发明人: Kazuya Hirata , Ryohei Yamamoto
- 申请人: DISCO CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: DISCO CORPORATION
- 当前专利权人: DISCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Greer Burns & Crain Ltd.
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@326d69b6
- 主分类号: C30B33/02
- IPC分类号: C30B33/02 ; H01L21/321 ; H01L29/16 ; H01L21/04 ; H01L21/687 ; B24B37/00 ; B23K26/00 ; B24B7/04 ; C30B29/00 ; B24B7/22
摘要:
A method for producing a wafer from a hexagonal single crystal ingot includes: planarizing an upper surface of the hexagonal single crystal ingot; applying a laser beam of such a wavelength as to be transmitted through the ingot, with a focal point positioned in an inside of a region not to be formed with devices of a wafer to be produced from the upper surface of the ingot which has been planarized, to form a production history; and applying a laser beam of such a wavelength as to be transmitted through the hexagonal single crystal ingot with a focal point of the laser beam positioned at a depth corresponding to a thickness of the wafer to be produced from the upper surface of the hexagonal single crystal ingot which has been planarized, to form an exfoliation layer.
公开/授权文献
- US20190148164A1 WAFER PRODUCING METHOD AND WAFER PRODUCING APPARATUS 公开/授权日:2019-05-16
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