Invention Grant
- Patent Title: Compensation device for transistors
-
Application No.: US16229379Application Date: 2018-12-21
-
Publication No.: US10763228B2Publication Date: 2020-09-01
- Inventor: David Seebacher , Andrea Del Chiaro , Peter Singerl , Ji Zhao
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7a9c6c4a
- Main IPC: H03F3/16
- IPC: H03F3/16 ; H01L23/66 ; H03F3/217 ; H03F1/34 ; H03F3/195 ; H03F1/08 ; H01L23/00

Abstract:
Devices including a transistor having a parasitic capacitance between a control terminal and a load terminal of a first type are provided. Furthermore, the devices include advantageously arranged inductances which are electromagnetically coupled to one another and are configured at least partly to compensate for an effect of the parasitic capacitance in a range around a resonant frequency.
Public/Granted literature
- US20190198465A1 Compensation Device for Transistors Public/Granted day:2019-06-27
Information query