Invention Grant
- Patent Title: Vertically stacked complementary-FET device with independent gate control
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Application No.: US16577032Application Date: 2019-09-20
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Publication No.: US10784171B2Publication Date: 2020-09-22
- Inventor: Julien Frougier , Ruilong Xie , Puneet Harischandra Suvarna
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L21/84
- IPC: H01L21/84 ; H01L27/12 ; H01L27/092 ; H01L21/822 ; H01L21/8238 ; H01L29/66

Abstract:
A device is disclosed that includes a first transistor device of a first type and a second transistor device of a second type positioned vertically above the first transistor, wherein the first type and second type of transistors are opposite types. The device also includes a gate structure for the first transistor and the second transistor, wherein the gate structure comprises a first gate electrode for the first transistor and a second gate electrode for the second transistor and a gate stack spacer positioned vertically between the first gate electrode and the second gate electrode so as to electrically isolate the first gate electrode from the second gate electrode.
Public/Granted literature
- US20200035569A1 VERTICALLY STACKED COMPLEMENTARY-FET DEVICE WITH INDEPENDENT GATE CONTROL Public/Granted day:2020-01-30
Information query
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