Invention Grant
- Patent Title: Semiconductor device including through silicon vias distributing current
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Application No.: US16263408Application Date: 2019-01-31
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Publication No.: US10784184B2Publication Date: 2020-09-22
- Inventor: Soojung Rho , Chisung Oh , Kyomin Sohn , Yong-Ki Kim , Jong-Ho Moon , SeungHan Woo , Jaeyoun Youn
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee IP Law, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@212f367e
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/538 ; H01L23/528 ; H01L23/522 ; H01L25/065

Abstract:
A semiconductor device includes first to M-th semiconductor dies stacked in a first direction. Each of the first to M-th semiconductor dies includes a substrate, first to K-th through silicon vias passing through the substrate in the first direction, and a first circuit to receive power through a power supply line electrically connected to the first through silicon via. Each of first to K-th through silicon vias of the N-th semiconductor die is electrically connected to a through silicon via of first to K-th through silicon vias of the (N+1)-th semiconductor die that is spaced apart therefrom in a plan view.
Public/Granted literature
- US20190237390A1 SEMICONDUCTOR DEVICE INCLUDING THROUGH SILICON VIAS DISTRIBUTING CURRENT Public/Granted day:2019-08-01
Information query
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