Invention Grant
- Patent Title: Test structure leveraging the lowest metallization level of an interconnect structure
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Application No.: US16185696Application Date: 2018-11-09
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Publication No.: US10790204B2Publication Date: 2020-09-29
- Inventor: Mankyu Yang , Vara Govindeswara Reddy Vakada , Edward Maciejewski , Brian Greene , Atsushi Ogino , Vikrant Chauhan , Prianka Sengupta
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L21/768 ; H01L21/66 ; H01L29/772

Abstract:
Structures for testing a field effect-transistor or Kelvin field-effect transistor, and methods of forming a structure for testing a field-effect transistor or Kelvin field-effect transistor. The structure includes a test pad, a device-under-testing having one or more source/drain regions, and a metallization level arranged over the device-under-testing. The metallization level includes one or more interconnect lines that are connected with the test pad. One or more contacts, which are arranged between the metallization level and the device-under-testing, directly connect the one or more interconnect lines with the one or more source/drain regions.
Public/Granted literature
- US20200152530A1 TEST STRUCTURE LEVERAGING THE LOWEST METALLIZATION LEVEL OF AN INTERCONNECT STRUCTURE Public/Granted day:2020-05-14
Information query
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