Invention Grant
- Patent Title: Mapping of patterns between design layout and patterning device
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Application No.: US16093401Application Date: 2017-04-04
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Publication No.: US10796063B2Publication Date: 2020-10-06
- Inventor: Duan-Fu Stephen Hsu , Jingjing Liu
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/057931 WO 20170404
- International Announcement: WO2017/178276 WO 20171019
- Main IPC: G06F30/398
- IPC: G06F30/398 ; G06F30/20 ; G03F1/36 ; G03F7/20 ; G03F1/00 ; G03F1/70

Abstract:
A method including obtaining at least a clip of a design layout, and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. A method including obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.
Public/Granted literature
- US20190130060A1 MAPPING OF PATTERNS BETWEEN DESIGN LAYOUT AND PATTERNING DEVICE Public/Granted day:2019-05-02
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