Invention Grant
- Patent Title: Hybrid design layout to identify optical proximity correction-related systematic defects
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Application No.: US16200060Application Date: 2018-11-26
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Publication No.: US10796065B2Publication Date: 2020-10-06
- Inventor: Allen Park , Ankit Jain
- Applicant: KLA-TENCOR CORPORATION
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: G06F30/398
- IPC: G06F30/398 ; G03F1/70 ; G03F7/20 ; G03F1/36
Abstract:
Defects can be identified using a hybrid design layout that includes a printable layer and a non-printed layer. The hybrid design layout can be generated by incorporating at least a portion of the non-printable layer layout with the printable layer layout. Defects can be identified using optical or scanning electron beam images.
Public/Granted literature
- US20190392111A1 HYBRID DESIGN LAYOUT TO IDENTIFY OPTICAL PROXIMITY CORRECTION-RELATED SYSTEMATIC DEFECTS Public/Granted day:2019-12-26
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