- 专利标题: Polycrystalline silicon rod, processing method for polycrystalline silicon rod, method for evaluating polycrystalline silicon rod, and method for producing FZ single crystal silicon
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申请号: US15537968申请日: 2015-12-09
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公开(公告)号: US10800659B2公开(公告)日: 2020-10-13
- 发明人: Shuichi Miyao , Shigeyoshi Netsu , Junichi Okada
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7bb05732
- 国际申请: PCT/JP2015/006142 WO 20151209
- 国际公布: WO2016/103608 WO 20160630
- 主分类号: C01B33/02
- IPC分类号: C01B33/02 ; C01B33/035 ; C30B29/06 ; C30B35/00 ; C30B13/30 ; G01N23/20 ; G01N23/207 ; C30B13/00
摘要:
For evaluating a polycrystalline silicon rod to be used as a raw material for production of FZ Si single crystals, novel evaluation values (values of characteristics×amount of crystals) including the amount of crystals grown in the growth direction (radial direction) are defined and the homogeneity in crystal characteristics in the growth direction (radial direction) is evaluated. Specifically, the homogeneity of the polycrystalline rod is evaluated by sampling a plurality of specimen plates each having, as a principal plane thereof, a cross-section perpendicular to a radial direction of the polycrystalline rod grown by a Siemens method at equal intervals in the radial direction, determining values of characteristics of the crystals of the specimen plates by measurements, and by using evaluation values obtained by multiplying amounts of the crystals (relative amounts of the crystals) at sites where the specimen plates have been sampled by the values of the crystal characteristics.
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