Invention Grant
- Patent Title: High throughput serial wafer handling end station
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Application No.: US15391086Application Date: 2016-12-27
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Publication No.: US10832926B2Publication Date: 2020-11-10
- Inventor: Joseph Ferrara , Robert J. Mitchell
- Applicant: Axcelis Technologies, Inc.
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677 ; C23C14/48

Abstract:
An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.
Public/Granted literature
- US20170178933A1 HIGH THROUGHPUT SERIAL WAFER HANDLING END STATION Public/Granted day:2017-06-22
Information query
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