Invention Grant
- Patent Title: Semiconductor devices including transistors comprising a charge trapping material, and related systems and methods
-
Application No.: US16107324Application Date: 2018-08-21
-
Publication No.: US10833087B2Publication Date: 2020-11-10
- Inventor: Fredrick D. Fishburn , Haitao Liu , Soichi Sugiura , Oscar O. Enomoto , Mark A. Zaleski , Keisuke Hirofuji , Makoto Morino , Ichiro Abe , Yoshiyuki Nanjo , Atsuko Otsuka
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L27/108 ; H01L29/423 ; H01L29/66

Abstract:
A semiconductor device comprises a memory storage component and a transistor in operable communication with the memory storage element. The transistor comprises a source region, a drain region, a gate electrode between the source region and the drain region, a charge trapping material surrounding at least an upper portion of the gate electrode, and an oxide material on sides of the charge trapping material. Related systems and methods are also disclosed.
Public/Granted literature
Information query
IPC分类: