- 专利标题： Superstrate and a method of using the same
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申请号： US16737362申请日： 2020-01-08
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公开(公告)号： US10859913B2公开(公告)日： 2020-12-08
- 发明人: Dwayne L. LaBrake , Niyaz Khusnatdinov
- 申请人： CANON KABUSHIKI KAISHA
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 代理机构： Abel Schillinger, LLP
- 主分类号： H01L21/311
- IPC分类号： H01L21/311 ; H01L21/3105 ; H01L21/308 ; H01L21/3065 ; G03F7/20 ; G03F7/00 ; C03C17/42
摘要：
A body of a superstrate can be used to form an adaptive planarization layer over a substrate that has a non-uniform topography. A body of a superstrate can have bending characteristics that are well suited to achieve both conformal and planarization behavior. The body can have a surface and a thickness in a range of t1 to t2, t1=(Pd4/2Eh)1/3; t2=(5Pd4/2Eh)1/3; P is a pressure corresponding to a capillary force between the body and a planarization precursor material; d is a bending distance; E is Young's modulus for the body; and h is a step height difference between two adjacent regions of a substrate. In an embodiment, a thickness can be selected and used to determine the maximum out-of-plane displacement, wmax, for conformal behavior is sufficient and that wmax for planarization behavior is below a predetermined threshold.
公开/授权文献
- US20200142300A1 SUPERSTRATE AND A METHOD OF USING THE SAME 公开/授权日：2020-05-07
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