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公开(公告)号：US11209730B2
公开(公告)日：2021-12-28
申请号：US16353433
申请日：2019-03-14
发明人： Logan L. Simpson , Steven Wayne Burns , Jason Battin , Niyaz Khusnatdinov , Christopher Ellis Jones , Craig William Cone , Wei Zhang , James W. Irving
摘要： One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.
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公开(公告)号：US11054739B2
公开(公告)日：2021-07-06
申请号：US16046810
申请日：2018-07-26
IPC分类号： G03F7/00 , H01L21/324
摘要： An apparatus and method configured to stabilize imprint head temperature. The apparatus and method includes an imprinting apparatus including, a mount attached to a fixed surface, a movable plate movable relative to the mount, at least one electromagnetic actuator mounted between the movable plate and the mount, wherein an electrical current is applied to the at least one electromagnetic actuator for controlling movement of the moveable plate, and wherein a root-mean-square of the electrical current applied to the at least one electromagnetic actuator in an idle state is equal to a root-mean-square of the electrical current applied to the at least one electromagnetic actuator during a continuous imprinting state.
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公开(公告)号：US10580659B2
公开(公告)日：2020-03-03
申请号：US16049003
申请日：2018-07-30
IPC分类号： H01L21/3105 , H01L21/02 , G03F7/00 , H01L21/66
摘要： Methods and apparatus for planarization of a substrate. Material is dispensed onto the substrate that varies depending upon the substrate topography variation. A superstrate is brought into contact with the material, the material takes on a shape of the superstrate. The material is solidified. The superstrate is lifted away from the solidified material. Material has a first shrinkage coefficient. Second material is dispensed onto the solidified material with an average thickness. The average thickness is greater than a second material thickness threshold that is dependent upon step height of the substrate and the first shrinkage coefficient. The second material is then solidified.
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公开(公告)号：US20190250505A1
公开(公告)日：2019-08-15
申请号：US15896756
申请日：2018-02-14
CPC分类号： G03F7/0002 , G03F7/70483
摘要： A body of a superstrate can be used to form an adaptive planarization layer over a substrate that has a non-uniform topography. A body of a superstrate can have bending characteristics that are well suited to achieve both conformal and planarization behavior. The body can have a surface and a thickness in a range of t1 to t2, t1=(Pd4/2Eh)1/3; t2=(5Pd4/2Eh)1/3; P is a pressure corresponding to a capillary force between the body and a planarization precursor material; d is a bending distance; E is Young's modulus for the body; and h is a step height difference between two adjacent regions of a substrate. In an embodiment, a thickness can be selected and used to determine the maximum out-of-plane displacement, wmax, for conformal behavior is sufficient and that wmax for planarization behavior is below a predetermined threshold.
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公开(公告)号：US20170282440A1
公开(公告)日：2017-10-05
申请号：US15418952
申请日：2017-01-30
CPC分类号： G03F7/0002
摘要： A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.
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公开(公告)号：US11294277B2
公开(公告)日：2022-04-05
申请号：US16045401
申请日：2018-07-25
摘要： A process, system, and method of manufacturing an article on a substrate having a fluid control feature. The fluid control feature may include at least one depressed region formed along an edge of an imprint field. Formable material is deposited in the imprint field of the substrate. A template is moved such that the template comes into contact with the formable material in the imprint field. While the template comes into contact with the formable material, the formable material may flow into the fluid control feature.
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公开(公告)号：US11073758B2
公开(公告)日：2021-07-27
申请号：US16177143
申请日：2018-10-31
摘要： An apparatus and method configured to brake and/or dampen an imprint head. The apparatus and method includes a mount attached to a fixed surface, a movable plate movable relative to the mount and configured to hold and move an imprint template or superstrate, at least one electromagnetic actuator with a first electrical terminal and a second electrical terminal, mounted between the movable plate and the mount, wherein an electrical current is applied to the at least one electromagnetic actuator for controlling movement of the moveable plate, an inductance serially connected at the first electrical terminal of the at least one electromagnetic actuator to control the electrical current, and at least one switch serially connectable to the second terminal of the at least one electromagnetic actuator and a terminal of the inductance to switch between a state where the inductance acts upon the at least one electromagnetic actuator or a state where the inductance does not act upon the at least one electromagnetic actuator.
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公开(公告)号：US10883006B2
公开(公告)日：2021-01-05
申请号：US15426282
申请日：2017-02-07
IPC分类号： B05D3/12 , C09D11/101 , G03F7/16 , C09D133/06 , B05D1/30 , B05D3/04 , B29C35/08 , B29C59/02 , C09D11/107 , C09D11/30 , C09D133/08 , C09D135/02 , G03F7/00 , B29K33/00 , B29L11/00 , B29L31/34
摘要： A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a polymerizable compound (a1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a polymerizable compound (a2) dropwise discretely onto the curable composition (A1) layer, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) except a solvent has a viscosity at 25° C. of 40 mPa·s or more and less than 500 mPa·s. The curable composition (A2) except a solvent has a viscosity at 25° C. of 1 mPa·s or more and less than 40 mPa·s.
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公开(公告)号：US10859913B2
公开(公告)日：2020-12-08
申请号：US16737362
申请日：2020-01-08
IPC分类号： H01L21/311 , H01L21/3105 , H01L21/308 , H01L21/3065 , G03F7/20 , G03F7/00 , C03C17/42
摘要： A body of a superstrate can be used to form an adaptive planarization layer over a substrate that has a non-uniform topography. A body of a superstrate can have bending characteristics that are well suited to achieve both conformal and planarization behavior. The body can have a surface and a thickness in a range of t1 to t2, t1=(Pd4/2Eh)1/3; t2=(5Pd4/2Eh)1/3; P is a pressure corresponding to a capillary force between the body and a planarization precursor material; d is a bending distance; E is Young's modulus for the body; and h is a step height difference between two adjacent regions of a substrate. In an embodiment, a thickness can be selected and used to determine the maximum out-of-plane displacement, wmax, for conformal behavior is sufficient and that wmax for planarization behavior is below a predetermined threshold.
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公开(公告)号：US10606171B2
公开(公告)日：2020-03-31
申请号：US15896756
申请日：2018-02-14
摘要： A body of a superstrate can be used to form an adaptive planarization layer over a substrate that has a non-uniform topography. A body of a superstrate can have bending characteristics that are well suited to achieve both conformal and planarization behavior. The body can have a surface and a thickness in a range of t1 to t2, t1=(Pd4/2Eh)1/3; t2=(5Pd4/2Eh)1/3; P is a pressure corresponding to a capillary force between the body and a planarization precursor material; d is a bending distance; E is Young's modulus for the body; and h is a step height difference between two adjacent regions of a substrate. In an embodiment, a thickness can be selected and used to determine the maximum out-of-plane displacement, wmax, for conformal behavior is sufficient and that wmax for planarization behavior is below a predetermined threshold.
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