- 专利标题: Mask and fabrication method thereof, display panel and touch panel
-
申请号: US16059481申请日: 2018-08-09
-
公开(公告)号: US10859920B2公开(公告)日: 2020-12-08
- 发明人: Liqing Liao , Hongmin Li , Jian Tao
- 申请人: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 申请人地址: CN Beijing CN Hefei
- 专利权人: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Beijing CN Hefei
- 优先权: CN201710975409 20171016
- 主分类号: G03C5/00
- IPC分类号: G03C5/00 ; G03F7/20 ; G06F3/044 ; G03F7/00 ; G03F1/76 ; G03F1/78 ; G06F3/041 ; H01L21/31 ; G03F7/22 ; H01L21/308 ; H01L21/311
摘要:
A fabrication method of a mask and a mask, a display panel and a touch panel are provided. The fabrication method of the mask includes: providing a substrate; forming a photoresist material layer on the substrate; and performing at least two scanning exposure processes on the photoresist material layer by using a scanning beam, wherein, each of the at least two scanning exposure processes is performed along a first direction parallel to a surface where the substrate is located, the scanning beam in each of the at least two scanning exposure processes scans the photoresist material layer in a scanning region having a preset width, at least one pair of adjacent scanning regions partially overlap with each other, and a partially overlapping region of the at least one pair of adjacent scanning regions is located in a first region of the mask.