Invention Grant
- Patent Title: Heterojunction bipolar transistor
-
Application No.: US16822889Application Date: 2020-03-18
-
Publication No.: US10886388B2Publication Date: 2021-01-05
- Inventor: Yasunari Umemoto , Shigeki Koya , Isao Obu
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto-fu
- Agency: Studebaker & Brackett PC
- Priority: JP2017-028690 20170220
- Main IPC: H01L29/73
- IPC: H01L29/73 ; H01L29/737 ; H01L29/66 ; H01L29/08 ; H01L29/205

Abstract:
A collector layer of an HBT includes a high-concentration collector layer and a low-concentration collector layer thereon. The low-concentration collector layer includes a graded collector layer in which the energy band gap varies to narrow with increasing distance from the base layer. The electron affinity of the semiconductor material for the base layer is greater than that of the semiconductor material for the graded collector layer at the point of the largest energy band gap by about 0.15 eV or less. The electron velocity in the graded collector layer peaks at a certain electric field strength. In the graded collector layer, the strength of the quasi-electric field, an electric field that acts on electrons as a result of the varying energy band gap, is between about 0.3 times and about 1.8 times the peak electric field strength, the electric field strength at which the electron velocity peaks.
Public/Granted literature
- US20200219995A1 HETEROJUNCTION BIPOLAR TRANSISTOR Public/Granted day:2020-07-09
Information query
IPC分类: