Invention Grant
- Patent Title: Lateral fin static induction transistor
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Application No.: US16281727Application Date: 2019-02-21
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Publication No.: US10892355B2Publication Date: 2021-01-12
- Inventor: Biqin Huang
- Applicant: HRL Laboratories, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Ladas & Parry
- Main IPC: H01L29/772
- IPC: H01L29/772 ; H01L29/16 ; H01L29/66 ; H01L29/10 ; H01L29/812 ; H01L29/167 ; H01L29/06 ; H01L21/761 ; H01L29/165 ; H01L29/08 ; H01L29/78

Abstract:
Presented is a lateral fin static induction transistor including a semi conductive substrate, source and drain regions extending from an optional buffer layer of same or varied thickness supported by the semi conductive substrate, a semi conductive channel electrically coupling the source region to the drain region of the transistor, a portion of the semi conductive channel being a fin and having a face covered by a gated structure, thereby defining a gated channel within the semi conductive channel, the semi conductive channel further including a drift region electrically coupling the gated channel to the drain region of the transistor.
Public/Granted literature
- US20190189791A1 LATERAL FIN STATIC INDUCTION TRANSISTOR Public/Granted day:2019-06-20
Information query
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