- 专利标题: X-ray diffraction apparatus
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申请号: US15668746申请日: 2017-08-04
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公开(公告)号: US10900913B2公开(公告)日: 2021-01-26
- 发明人: Takeshi Osakabe , Tetsuya Ozawa
- 申请人: Rigaku Corporation
- 申请人地址: JP Tokyo
- 专利权人: Rigaku Corporation
- 当前专利权人: Rigaku Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2016-160316 20160818
- 主分类号: G01N23/20
- IPC分类号: G01N23/20 ; G01N23/04 ; G01N23/20008 ; G01N23/20025 ; G01N23/201 ; G01N23/207
摘要:
An X-ray diffraction apparatus including an X-ray detector that is configured to detect diffracted X-rays diffracted from a sample when a surface of the sample is irradiated with X-rays, a counter arm which rotates around a rotation center axis set within the surface of the sample while the X-ray detector is installed on the counter arm, and a plate-like X-ray shielding member that is installed on the counter arm and rotated together with the X-ray detector.
公开/授权文献
- US20180052121A1 X-RAY DIFFRACTION APPARATUS 公开/授权日:2018-02-22
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