Invention Grant
- Patent Title: Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite prepared therefrom
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Application No.: US15241224Application Date: 2016-08-19
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Publication No.: US10983433B2Publication Date: 2021-04-20
- Inventor: Shang Hyeun Park , Hojeong Paek , Eun Joo Jang , Shin Ae Jun
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
- Applicant Address: KR Suwon-si; KR Yongin-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Suwon-si; KR Yongin-si
- Agency: Cantor Colburn LLP
- Priority: KR10-2015-0118208 20150821
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/033 ; G03F7/004 ; C09D4/06 ; C08F220/14 ; C09K11/02 ; C09K11/70 ; G02B5/20 ; G02B5/22 ; B82Y40/00 ; B82Y30/00

Abstract:
A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.
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