Invention Grant
- Patent Title: Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom
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Application No.: US15375601Application Date: 2016-12-12
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Publication No.: US10990006B2Publication Date: 2021-04-27
- Inventor: Shang Hyeun Park , Hojeong Paek , Jonggi Kim , Nayoun Won , Shin Ae Jun
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
- Applicant Address: KR Suwon-si; KR Yongin-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Suwon-si; KR Yongin-si
- Agency: Cantor Colburn LLP
- Priority: KR10-2015-0181302 20151217
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/004 ; G03F7/031 ; G03F7/00 ; G03F7/029 ; G03F7/033

Abstract:
A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand bound to a surface of the quantum dot; a photoinitiator; a binder including a carboxylic acid group; a photopolymerizable monomer having a carbon-carbon double bond; and a solvent, wherein the photoinitiator includes a first photoinitiator including an oxime compound and a second photoinitiator including at least one selected from a phosphine oxide compound and an amino ketone compound.
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