Invention Grant
- Patent Title: Apparatus and method for treating substrate
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Application No.: US16556025Application Date: 2019-08-29
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Publication No.: US10991603B2Publication Date: 2021-04-27
- Inventor: Oh Jin Kwon , Chong-Min Ryu , Young Ho Choo
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Li & Cai Intellectual Property (USA) Office
- Priority: KR10-2018-0102297 20180829
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02
Abstract:
A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.
Public/Granted literature
- US20200075355A1 APPARATUS AND METHOD FOR TREATING SUBSTRATE Public/Granted day:2020-03-05
Information query
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