Invention Grant
- Patent Title: X-ray topographic apparatus and substrate processing system using the apparatus
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Application No.: US16683397Application Date: 2019-11-14
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Publication No.: US11004754B2Publication Date: 2021-05-11
- Inventor: Jin-Yeol Yang , Hyung-Su Son , Hae-Gu Lee , Dong-Su Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR10-2017-0141559 20171027
- Main IPC: H01L21/66
- IPC: H01L21/66 ; H01L21/78 ; B23K26/359 ; G01N23/20 ; B23K26/03 ; B23K26/00 ; B23K26/08 ; B23K26/0622 ; B23K26/53 ; B23K103/00 ; H01L21/263 ; H01L21/683 ; B23K101/40 ; H01L21/304

Abstract:
A laser processing method includes irradiating a laser light into a substrate along a cutting line to form a laser-scribed layer within the substrate, irradiating an X-ray onto a first surface of the substrate along the cutting line, obtaining an image of a diffracted X-ray from the substrate, and determining whether or not the laser-scribed layer is formed along the cutting line, based on analysis of the obtained image of the diffracted X-ray.
Public/Granted literature
- US20200083124A1 X-RAY TOPOGRAPHIC APPARATUS AND SUBSTRATE PROCESSING SYSTEM USING THE APPARATUS Public/Granted day:2020-03-12
Information query
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