Metal-insulator-metal capacitor structure to increase capacitance density
Abstract:
Various embodiments of the present disclosure are directed towards an integrated circuit (IC) including a capacitor. The capacitor is over a substrate and includes a first electrode having a plurality of first electrode layers that are vertically stacked over one another. The plurality of first electrode layers respectively contact an adjacent first electrode layer in a plurality of first connection regions. A second electrode including a plurality of second electrode layers that are vertically stacked over one another. The plurality of second electrode layers respectively contact an adjacent second electrode layer in a plurality of second connection regions. The plurality of second electrode layers are respectively stacked between adjacent ones of the plurality of first electrode layers. A capacitor dielectric structure separates the plurality of first electrode layers and the plurality of second electrode layers.
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