Invention Grant
- Patent Title: Metal-insulator-metal capacitor structure to increase capacitance density
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Application No.: US16543859Application Date: 2019-08-19
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Publication No.: US11018169B2Publication Date: 2021-05-25
- Inventor: Yimin Huang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L49/02

Abstract:
Various embodiments of the present disclosure are directed towards an integrated circuit (IC) including a capacitor. The capacitor is over a substrate and includes a first electrode having a plurality of first electrode layers that are vertically stacked over one another. The plurality of first electrode layers respectively contact an adjacent first electrode layer in a plurality of first connection regions. A second electrode including a plurality of second electrode layers that are vertically stacked over one another. The plurality of second electrode layers respectively contact an adjacent second electrode layer in a plurality of second connection regions. The plurality of second electrode layers are respectively stacked between adjacent ones of the plurality of first electrode layers. A capacitor dielectric structure separates the plurality of first electrode layers and the plurality of second electrode layers.
Public/Granted literature
- US20210057469A1 METAL-INSULATOR-METAL CAPACITOR STRUCTURE TO INCREASE CAPACITANCE DENSITY Public/Granted day:2021-02-25
Information query
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