发明授权
- 专利标题: Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber
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申请号: US16879105申请日: 2020-05-20
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公开(公告)号: US11049704B1公开(公告)日: 2021-06-29
- 发明人: Irit Ruach-Nir , Michal Eilon , Guy Eytan , Magen Yaacov Schulman , Sven Ruhle , Manuel Radek , Igor Krivts (Krayvitz)
- 申请人: APPLIED MATERIALS ISRAEL LTD.
- 申请人地址: IL Rehovot
- 专利权人: APPLIED MATERIALS ISRAEL LTD.
- 当前专利权人: APPLIED MATERIALS ISRAEL LTD.
- 当前专利权人地址: IL Rehovot
- 代理机构: Kilpatrick Townsend & Stockton LLP
- 主分类号: H01J49/00
- IPC分类号: H01J49/00 ; H01J49/04 ; H01J49/28
摘要:
A cleanliness monitor, an evaluation system and a method. The cleanliness monitor may include: a first vacuum chamber, a second vacuum chamber, a molecule collector, a release unit, a mass spectrometer, a manipulator that may be configured to move the molecule collector from the first position to the second position, and an analyzer. The mass spectrometer may have a line of sight to an inner space of the second vacuum chamber. The mass spectrometer may be configured to monitor the inner space of the second vacuum chamber and to generate detection signals that are indicative of a content of the inner space of the second vacuum chamber. A first subset of the detection signals may be indicative of a presence of the at least subset of released organic molecules. The analyzer may be configured to determine, based on the detection signals, the cleanliness of at least one out of (a) the first vacuum chamber, and (b) a tested vacuum chamber. The tested vacuum chamber is fluidly coupled to the first vacuum chamber.
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