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    Evaluating a contact between a wafer and an electrostatic chuck
    1.
    发明授权
    Evaluating a contact between a wafer and an electrostatic chuck 有权

    公开(公告)号：US11694869B2

    公开(公告)日：2023-07-04

    申请号：US17115656

    申请日：2020-12-08

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Adam Faust ,  Yosef Basson ,  Guy Eytan ,  Yonathan David

    IPC: H01J37/20 ,  H01L21/683 ,  H01L21/67 ,  G01N27/04 ,  H01J37/28

    CPC classification number: H01J37/20 ,  G01N27/041 ,  H01J37/28 ,  H01L21/67259 ,  H01L21/6831

    Abstract: A method, a non-transitory computer readable medium and a device. The method may include (a) introducing a voltage difference between an absolute value of a negative pole of the electrostatic chuck and an absolute value of a positive pole of the electrostatic chuck, the introducing occurs while the wafer is supported by the electrostatic chuck and is contacted by one or more conductive contact pins of the electrostatic chuck; (b) monitoring, by an electrostatic sensor that comprises a sensing element, a charge at a point of measurement located at a front side of the wafer, at different points of time that follow a start of the introducing of the voltage difference, to provide monitoring results; and (c) determining an electrical parameter of the contact between the wafer and the electrostatic chuck, based on the monitoring results.

    SYSTEM, COMPUTER PROGRAM PRODUCT, AND METHOD FOR DISSIPATION OF AN ELECTRICAL CHARGE
    2.
    发明申请
    SYSTEM, COMPUTER PROGRAM PRODUCT, AND METHOD FOR DISSIPATION OF AN ELECTRICAL CHARGE 审中-公开

    公开(公告)号：US20190090335A1

    公开(公告)日：2019-03-21

    申请号：US15708974

    申请日：2017-09-19

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Guy Eytan ,  Emil Weisz ,  Samuel Ives Nackash ,  Albert Karabekov

    IPC: H05F3/06 ,  G01R29/12

    Abstract: A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.

    EVALUATING A CONTACT BETWEEN A WAFER AND AN ELECTROSTATIC CHUCK
    3.
    发明申请
    EVALUATING A CONTACT BETWEEN A WAFER AND AN ELECTROSTATIC CHUCK 有权

    公开(公告)号：US20220181115A1

    公开(公告)日：2022-06-09

    申请号：US17115656

    申请日：2020-12-08

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Adam Faust ,  Yosef Basson ,  Guy Eytan ,  Yonathan David

    IPC: H01J37/20 ,  H01L21/683 ,  H01L21/67 ,  G01N27/04 ,  H01J37/28

    Abstract: A method, a non-transitory computer readable medium and a device. The method may include (a) introducing a voltage difference between an absolute value of a negative pole of the electrostatic chuck and an absolute value of a positive pole of the electrostatic chuck, the introducing occurs while the wafer is supported by the electrostatic chuck and is contacted by one or more conductive contact pins of the electrostatic chuck; (b) monitoring, by an electrostatic sensor that comprises a sensing element, a charge at a point of measurement located at a front side of the wafer, at different points of time that follow a start of the introducing of the voltage difference, to provide monitoring results; and (c) determining an electrical parameter of the contact between the wafer and the electrostatic chuck, based on the monitoring results.

    Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber
    5.
    发明授权
    Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber 有权

    公开(公告)号：US11049704B1

    公开(公告)日：2021-06-29

    申请号：US16879105

    申请日：2020-05-20

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Irit Ruach-Nir ,  Michal Eilon ,  Guy Eytan ,  Magen Yaacov Schulman ,  Sven Ruhle ,  Manuel Radek ,  Igor Krivts (Krayvitz)

    IPC: H01J49/00 ,  H01J49/04 ,  H01J49/28

    Abstract: A cleanliness monitor, an evaluation system and a method. The cleanliness monitor may include: a first vacuum chamber, a second vacuum chamber, a molecule collector, a release unit, a mass spectrometer, a manipulator that may be configured to move the molecule collector from the first position to the second position, and an analyzer. The mass spectrometer may have a line of sight to an inner space of the second vacuum chamber. The mass spectrometer may be configured to monitor the inner space of the second vacuum chamber and to generate detection signals that are indicative of a content of the inner space of the second vacuum chamber. A first subset of the detection signals may be indicative of a presence of the at least subset of released organic molecules. The analyzer may be configured to determine, based on the detection signals, the cleanliness of at least one out of (a) the first vacuum chamber, and (b) a tested vacuum chamber. The tested vacuum chamber is fluidly coupled to the first vacuum chamber.

    SCANNING ELECTRON MICROSCOPY-BASED TOMOGRAPHY OF SPECIMENS
    7.
    发明申请
    SCANNING ELECTRON MICROSCOPY-BASED TOMOGRAPHY OF SPECIMENS 有权

    公开(公告)号：US20240404784A1

    公开(公告)日：2024-12-05

    申请号：US18203034

    申请日：2023-05-29

    Applicant: Applied Materials Israel Ltd.

    Inventor： Itamar Shani ,  Konstantin Chirko ,  Lior Yaron ,  Guy Eytan ,  Guy Shwartz

    IPC: H01J37/28 ,  G06T11/00 ,  G06T11/20

    Abstract: Disclosed herein is a system for non-destructive tomography of specimens. The system includes a scanning electron microscope (SEM) and a processor(s). The SEM is configured to obtain a sinogram of a tested specimen, parameterized by a vector {right arrow over (s)}, by projecting e-beams on the tested specimen, at each of a plurality of projection directions and offsets, and. for each e-beam, measuring a respective intensity of electrons returned from the tested specimen, The processor(s) is configured to obtain a tomographic map, pertaining to the tested specimen, by determining values indicative of components of a vector {right arrow over (t)} defined by an equation W{right arrow over (t)}={right arrow over (s)}. W is a matrix with components wij specifying a contribution of a j-th voxel in a nominal specimen to an i-th element of a nominal sinogram of the nominal specimen. The matrix W accounts for e-beam expansion and attenuation with depth within the nominal specimen.

    REACTIVE PARTICLES SUPPLY SYSTEM
    8.
    发明申请
    REACTIVE PARTICLES SUPPLY SYSTEM 有权

    公开(公告)号：US20220199370A1

    公开(公告)日：2022-06-23

    申请号：US17129747

    申请日：2020-12-21

    Applicant: Applied Materials Israel Ltd.

    Inventor： Asaf Gutman ,  Irit Ruach-Nir ,  Kfir Luria ,  Sven Ruhle ,  Guy Eytan

    IPC: H01J37/32

    Abstract: A reactive particles supply system that may include an adjustable gas supply unit that is arranged to supply gas and to set a gas condition, a reactive particles supply unit that may be arranged to receive the gas, and an adjustable reactive particles output unit that may include a reactive particles input, a second reactive particles output, and a reactive particles path. The second reactive particles output is configured to output reactive particles towards an opening of a vacuumed chamber. The adjustable reactive particles output unit is arranged to mechanically configure at least one element of the reactive particles path according to the reactive particles condition.

    Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber
    10.
    发明授权
    Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber 有权

    公开(公告)号：US10910204B2

    公开(公告)日：2021-02-02

    申请号：US16576588

    申请日：2019-09-19

    Applicant: Applied Materials Israel Ltd.

    Inventor： Irit Ruach-Nir ,  Michal Eilon ,  Guy Eytan ,  Magen Yaacov Schulman

    IPC: H01J49/04 ,  H01J37/18 ,  H01J49/00

    Abstract: A cleanliness monitor for monitoring a cleanliness of a vacuum chamber. The cleanliness monitor may include a mass spectrometer, a molecule aggregation and release unit and an analyzer. The molecule aggregation and release unit is configured to (a) aggregate, during an aggregation period, organic molecules that are present in the vacuum chamber and (b) induce, during a release period, a release of a subset of the organic molecules towards the mass spectrometer. The mass spectrometer is configured to monitor an environment within the vacuum chamber and to generate detection signals indicative of a content of the environment; wherein a first subset of the detection signals is indicative of a presence of the subset of the organic molecules. The analyzer is configured to determine the cleanliness of the vacuum chamber based on the detection signals.

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