Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US16811065Application Date: 2020-03-06
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Publication No.: US11075122B2Publication Date: 2021-07-27
- Inventor: Tomonari Shioda , Takashi Ishida
- Applicant: Kioxia Corporation
- Applicant Address: JP Minato-ku
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2019-162305 20190905
- Main IPC: H01L21/8234
- IPC: H01L21/8234 ; H01L23/535 ; H01L27/11556 ; H01L27/11582

Abstract:
A semiconductor device according to an embodiment includes: a semiconductor substrate including a first surface, a first contact part provided at a deeper level than the first surface, and a second contact part protruding up to a higher level than the first surface from the first contact part; a stacked body in which insulating layers and electrode layers are alternately stacked on the first surface; and a semiconductor film extending, on the second contact part, in the stacked body in a first direction perpendicular to the first surface. At an interface between the first contact part and the second contact part, a length of the first contact part in a second direction parallel to the first surface is larger than a length of the second contact part in the second direction.
Public/Granted literature
- US20210074592A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-03-11
Information query
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