- 专利标题： Method for depositing protection film of light-emitting element
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申请号： US16189660申请日： 2018-11-13
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公开(公告)号： US11118266B2公开(公告)日： 2021-09-14
- 发明人: Hong-Jae Lee , Jong-Hwan Kim , Woo-Pil Shim , Woo-Jin Lee , Sung-Yean Yoon , Don-Hee Lee
- 申请人： TES CO., LTD
- 申请人地址： KR Gyeonggi-do
- 专利权人： TES CO., LTD
- 当前专利权人： TES CO., LTD
- 当前专利权人地址： KR Gyeonggi-do
- 代理机构： Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- 代理商 Steven M. Jensen
- 优先权： KR10-2016-0060938 20160518
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/455 ; H01L51/56 ; C23C16/505 ; H01L33/44 ; H01L33/00 ; H01L33/02 ; H01L51/52 ; C23C16/34 ; C23C16/40
摘要：
The present invention relates to a method for depositing a protection film of a light-emitting element, the method comprising the steps of: depositing a first protection layer on a light-emitting element of a substrate by means of the atomic layer deposition method; and depositing at least one additional protection layer on the first protection layer by means of the plasma-enhanced chemical vapor deposition method.
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