Invention Grant
- Patent Title: Ceria removal compositions
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Application No.: US16782912Application Date: 2020-02-05
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Publication No.: US11124741B2Publication Date: 2021-09-21
- Inventor: Atanu K. Das , Michael White , Daniela White
- Applicant: ENTEGRIS, INC.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Agency: Entegris, Inc.
- Main IPC: C11D7/32
- IPC: C11D7/32 ; C11D3/36 ; C11D1/90 ; C11D3/20 ; C11D3/33
Abstract:
The present invention generally relates to a removal composition and process, particularly useful for cleaning ceria particles and CMP contaminants from microelectronic devices having said particles and CMP contaminants thereon, in particular microelectronic devices having PETEOS, Silicon Nitride, and Poly-Si substrates. In one aspect, the invention provides treatment of the microelectronic substrate having ceria particles thereon utilizing complexing agents free of Sulfur and Phosphorous atoms.
Public/Granted literature
- US20200255770A1 CERIA REMOVAL COMPOSITIONS Public/Granted day:2020-08-13
Information query
