Invention Grant
- Patent Title: Substrate processing method, substrate processing apparatus and pre-drying processing liquid
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Application No.: US16445451Application Date: 2019-06-19
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Publication No.: US11124869B2Publication Date: 2021-09-21
- Inventor: Yuta Sasaki , Masayuki Otsuji , Naozumi Fujiwara , Masahiko Kato , Yu Yamaguchi , Hiroaki Takahashi
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JPJP2018-119092 20180622,JPJP2019-050214 20190318
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C23C14/12

Abstract:
A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.
Public/Granted literature
- US20190390320A1 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND PRE-DRYING PROCESSING LIQUID Public/Granted day:2019-12-26
Information query
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