公开(公告)号：US11769663B2

公开(公告)日：2023-09-26

申请号：US17859346

申请日：2022-07-07

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Masayuki Otsuji ,  Hiroaki Takahashi ,  Masahiko Kato ,  Yu Yamaguchi ,  Yuta Sasaki

IPC: B08B7/00 ,  H01L21/02 ,  B08B3/08 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/02101 ,  B08B3/08 ,  B08B7/0014 ,  H01L21/67034 ,  H01L21/68764

Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.

公开(公告)号：US11417513B2

公开(公告)日：2022-08-16

申请号：US16898499

申请日：2020-06-11

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Masayuki Otsuji ,  Hiroaki Takahashi ,  Masahiko Kato ,  Yu Yamaguchi ,  Yuta Sasaki

IPC: B08B7/00 ,  B08B3/08 ,  H01L21/02 ,  H01L21/687 ,  H01L21/67

Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.

公开(公告)号：US11851745B2

公开(公告)日：2023-12-26

申请号：US17363161

申请日：2021-06-30

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Yuta Sasaki ,  Masayuki Otsuji ,  Naozumi Fujiwara ,  Masahiko Kato ,  Yu Yamaguchi ,  Hiroaki Takahashi

IPC: C23C14/24 ,  C23C14/12

CPC classification number: C23C14/24 ,  C23C14/12

Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.

公开(公告)号：US11124869B2

公开(公告)日：2021-09-21

申请号：US16445451

申请日：2019-06-19

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Yuta Sasaki ,  Masayuki Otsuji ,  Naozumi Fujiwara ,  Masahiko Kato ,  Yu Yamaguchi ,  Hiroaki Takahashi

IPC: C23C14/24 ,  C23C14/12

Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.

公开(公告)号：US10586693B2

公开(公告)日：2020-03-10

申请号：US15629214

申请日：2017-06-21

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Masahiko Kato ,  Katsuhiko Miya ,  Hiroyuki Yashiki

IPC: H01L21/02 ,  H01L21/67 ,  B08B3/10 ,  B08B7/00

Abstract: A substrate processing apparatus comprises: a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate W held horizontally; a cooling gas discharge nozzle which discharges cooling gas of a temperature lower than a freezing point of the liquid forming the liquid film to the liquid film; a thawing liquid discharge nozzle which discharges a thawing liquid to a frozen film formed by freezing the liquid film; a thawing liquid supplier which supplies the heated thawing liquid to the thawing liquid discharge nozzle via a pipe; and a receiver which receives the cooling gas and the thawing liquid respectively discharged from the cooling gas discharge nozzle and the thawing liquid discharge nozzle at the respective retracted position and guides the cooling gas and the thawing liquid to a common flow passage.