Invention Grant
- Patent Title: Semiconductor inductors
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Application No.: US16617548Application Date: 2017-06-30
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Publication No.: US11127813B2Publication Date: 2021-09-21
- Inventor: Georg Seidemann , Bernd Waidhas , Thomas Wagner , Andreas Wolter , Andreas Augustin
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2017/040381 WO 20170630
- International Announcement: WO2019/005124 WO 20190103
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/00 ; H01L49/02 ; H01F17/04 ; H01L21/02 ; H01L21/56 ; H01L23/64

Abstract:
The present disclosure is directed to systems and methods for fabricating a semiconductor inductor that includes a coil deposited on a stop layer that is deposited on a sacrificial substrate. The semiconductor inductor may be fabricated on a silicon wafer and singulated. The sacrificial substrate beneficially provides structural support for the singulated semiconductor inductor. The singulated semiconductor inductor advantageously requires minimal active die surface area. The removal of the sacrificial substrate after coupling to the active die beneficially reduces the overall thickness (or height) of the semiconductor package, providing a decided advantage in low profile, portable, electronic devices.
Public/Granted literature
- US20200185490A1 SEMICONDUCTOR INDUCTORS Public/Granted day:2020-06-11
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