Invention Grant
- Patent Title: Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same
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Application No.: US16250069Application Date: 2019-01-17
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Publication No.: US11149234B2Publication Date: 2021-10-19
- Inventor: Mi Hyun Park , Jung-Min Oh , Young-Hoo Kim , Hyo San Lee , Tae Keun Kim , Ye Rim Yeon , Hae Rim Oh , Ji Soo Jeong , Min Hee Cho
- Applicant: Samsung Electronics Co., Ltd. , SEMES Co., Ltd.
- Applicant Address: KR Suwon-si; KR Cheonan-si
- Assignee: Samsung Electronics Co., Ltd.,SEMES Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.,SEMES Co., Ltd.
- Current Assignee Address: KR Suwon-si; KR Cheonan-si
- Agency: Lee IP Law, P.C.
- Priority: KR10-2018-0015263 20180207
- Main IPC: B08B3/10
- IPC: B08B3/10 ; C11D11/00 ; H01L21/67 ; H01L21/687 ; H01L21/02 ; C11D17/00 ; C11D3/28 ; C11D3/20 ; C11D3/34 ; C11D3/32 ; C11D1/14 ; C11D1/12 ; C11D1/29
Abstract:
A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.35.
Public/Granted literature
- US20190241844A1 CLEANING COMPOSITION, CLEANING APPARATUS, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME Public/Granted day:2019-08-08
Information query
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