Invention Grant
- Patent Title: Method of directly growing carbon material on substrate
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Application No.: US16244906Application Date: 2019-01-10
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Publication No.: US11149346B2Publication Date: 2021-10-19
- Inventor: Changhyun Kim , Hyeonjin Shin , Kyung-Eun Byun , Keunwook Shin , Changseok Lee , Seunggeol Nam , Sungjoo An , Janghee Lee , Jeonil Lee , Yeonchoo Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0086770 20180725
- Main IPC: C23C16/26
- IPC: C23C16/26 ; C01B32/186 ; C23C14/02 ; C23C16/56 ; C23C14/06

Abstract:
Provided are methods of directly growing a carbon material. The method may include a first operation and a second operation. The first operation may include adsorbing carbons onto a substrate by supplying the carbons to the substrate. The second operation may include removing unreacted carbon residues from the substrate after suspending the supplying the carbons of the first operation. The two operations may be repeated until a desired graphene is formed on the substrate. The substrate may be maintained at a temperature less than 700° C. In another embodiment, the method may include forming a carbon layer on a substrate, removing carbons that are not directly adsorbed to the substrate on the carbon layer, and repeating the two operations until desired graphene is formed on the substrate. The forming of the carbon layer includes supplying individual carbons onto the substrate by preparing the individual carbons.
Public/Granted literature
- US20200032388A1 METHOD OF DIRECTLY GROWING CARBON MATERIAL ON SUBSTRATE Public/Granted day:2020-01-30
Information query
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