Invention Grant
- Patent Title: Reflective mask blank and reflective mask
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Application No.: US16056786Application Date: 2018-08-07
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Publication No.: US11150550B2Publication Date: 2021-10-19
- Inventor: Hiroshi Hanekawa , Tsuyoshi Kakuta , Yoichi Sera , Sadatatsu Ikeda
- Applicant: AGC INC.
- Applicant Address: JP Chiyoda-ku
- Assignee: AGC INC.
- Current Assignee: AGC INC.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2017-155403 20170810,JPJP2017-182146 20170922
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/48 ; G03F1/52 ; G03F1/54

Abstract:
A reflective mask blank includes, on/above a substrate in the following order from the substrate side a multilayer reflective film which reflects EUV light and an absorber film which absorbs EUV light. The absorber film is a tantalum-based material film containing a tantalum-based material. The absorber film provides a peak derived from the tantalum-based material in an X-ray diffraction pattern, the peak having a peak diffraction angle (2θ) of 36.8 degrees or more and a full width at half maximum of 1.5 degrees or more.
Public/Granted literature
- US20190049836A1 REFLECTIVE MASK BLANK AND REFLECTIVE MASK Public/Granted day:2019-02-14
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