- Patent Title: Non-volatile memory bit cells with non-rectangular floating gates
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Application No.: US16695725Application Date: 2019-11-26
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Publication No.: US11158643B2Publication Date: 2021-10-26
- Inventor: Lanxiang Wang , Shyue Seng Tan , Kiok Boone Elgin Quek , Xinshu Cai , Eng Huat Toh
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Thompson Hine LLP
- Main IPC: H01L27/11519
- IPC: H01L27/11519 ; H01L27/11521

Abstract:
Structures for a non-volatile memory bit cell and methods of forming a structure for a non-volatile memory bit cell. A field-effect transistor has a channel region and a first gate electrode positioned over the channel region. A capacitor includes a second gate electrode that is coupled to the first gate electrode to define a floating gate. The first gate electrode has a non-rectangular shape.
Public/Granted literature
- US20210159234A1 NON-VOLATILE MEMORY BIT CELLS WITH NON-RECTANGULAR FLOATING GATES Public/Granted day:2021-05-27
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