Invention Grant
- Patent Title: Laser source device, extreme ultraviolet lithography device and method
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Application No.: US16846103Application Date: 2020-04-10
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Publication No.: US11158989B2Publication Date: 2021-10-26
- Inventor: Henry Yee-Shian Tong , Wen-Chih Wang , Hsin-Liang Chen , Louis Chun-Lin Chang , Cheng-Chieh Chen , Li-Jui Chen , Po-Chung Cheng , Jeng-Yann Tsay
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01S3/0971
- IPC: H01S3/0971 ; H01S3/00 ; H05G2/00 ; G01J3/443 ; G03F7/20 ; G01J3/02

Abstract:
A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
Public/Granted literature
- US20200245443A1 LASER SOURCE DEVICE, EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE AND METHOD Public/Granted day:2020-07-30
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