Invention Grant
- Patent Title: Transistor array panel and manufacturing method thereof
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Application No.: US16987952Application Date: 2020-08-07
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Publication No.: US11183518B2Publication Date: 2021-11-23
- Inventor: Yu-Gwang Jeong , Hyun Min Cho , Su Bin Bae , Shin Il Choi , Sang Gab Kim
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2016-0053466 20160429
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/311 ; H01L29/417 ; H01L29/786 ; G02F1/1368 ; H01L27/32

Abstract:
A transistor array panel is manufactured by a method that reduces or obviates the need for highly selective etching agents or complex processes requiring multiple photomasks to create contact holes. The panel includes: a substrate; a buffer layer positioned on the substrate; a semiconductor layer positioned on the buffer layer; an intermediate insulating layer positioned on the semiconductor layer; and an upper conductive layer positioned on the intermediate insulating layer, wherein the semiconductor layer includes a first contact hole, the intermediate insulating layer includes a second contact hole positioned in an overlapping relationship with the first contact hole, and the upper conductive layer is in contact with a side surface of the semiconductor layer in the first contact hole.
Information query
IPC分类: