Invention Grant
- Patent Title: Self-aligning metal patterning based on photonic sintering of metal nanoparticles
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Application No.: US15740589Application Date: 2016-06-30
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Publication No.: US11185918B2Publication Date: 2021-11-30
- Inventor: Zhiyi Zhang , Ye Tao , Ta-Ya Chu , Gaozhi Xiao
- Applicant: National Research Council of Canada
- Applicant Address: CA Ottawa
- Assignee: National Research Council of Canada
- Current Assignee: National Research Council of Canada
- Current Assignee Address: CA Ottawa
- Agency: Wegman Hessler
- International Application: PCT/CA2016/050769 WO 20160630
- International Announcement: WO2017/004704 WO 20170112
- Main IPC: B22F3/105
- IPC: B22F3/105 ; B22F3/24 ; B22F5/00 ; B22F7/04 ; G03F7/004 ; G03F7/20 ; G03F7/40 ; H01L51/00 ; H01L51/05 ; H05K1/09 ; H05K3/06 ; H05K3/46 ; B82Y20/00
Abstract:
A method is disclosed for aligning layers in fabricating a multilayer printable electronic device. The method entails providing a transparent substrate upon which a first metal layer is deposited, providing a transparent functional layer over the first metal layer, depositing metal nano particles over the functional layer to form a second metal layer, exposing the metal nano particles to intense pulsed light via an underside of the substrate to partially sinter exposed particles to the functional layer whereby the first metal layer acts as a photo mask, and washing away unexposed particles using a solvent to leave partially sintered metal nano particles on the substrate.
Public/Granted literature
- US20180185922A1 SELF-ALIGNING METAL PATTERNING BASED ON PHOTONIC SINTERING OF METAL NANOPARTICLES Public/Granted day:2018-07-05
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