Invention Grant
- Patent Title: Tapered resistive memory with interface dipoles
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Application No.: US16587543Application Date: 2019-09-30
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Publication No.: US11189786B2Publication Date: 2021-11-30
- Inventor: Reinaldo Vega , Takashi Ando , Jianshi Tang , Praneet Adusumilli
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Michael J. Chang, LLC
- Agent Randall Bluestone
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
Tapered resistive memory devices with interface dipoles are provided. In one aspect, a ReRAM device includes: a bottom electrode; a core dielectric that is thermally conductive disposed on the bottom electrode; an oxide resistive memory cell disposed along outer sidewalls of the core dielectric, wherein the oxide resistive memory cell has inner edges adjacent to the core dielectric, and outer edges that are tapered; an outer coating disposed adjacent to the outer edges of the oxide resistive memory cell; and a top electrode disposed on the core dielectric, the oxide resistive memory cell, and the outer coating. A method of forming a ReRAM device as well as a method of operating a ReRAM device are also provided.
Public/Granted literature
- US20210098698A1 Tapered Resistive Memory with Interface Dipoles Public/Granted day:2021-04-01
Information query
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