Invention Grant
- Patent Title: Two-step solder-mask-defined design
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Application No.: US16664627Application Date: 2019-10-25
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Publication No.: US11207744B2Publication Date: 2021-12-28
- Inventor: Koustav Sinha , Hyunsuk Chun
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: B23K1/20
- IPC: B23K1/20 ; H01L23/498 ; B23K101/40 ; B23K101/42

Abstract:
An apparatus for a BGA package includes a pad mounted on a substrate. The apparatus also includes a solder resist layer disposed over the substrate and a buffer layer disposed over the solder resist layer. The solder resist layer can have a first aperture and the buffer layer can have a second aperture. The first and second apertures are aligned such that at least a portion of the pad is exposed to create a solder-mask-defined mounting pad. A diameter of the second aperture is larger than a diameter of the first aperture.
Public/Granted literature
- US20210121969A1 TWO-STEP SOLDER-MASK-DEFINED DESIGN Public/Granted day:2021-04-29
Information query
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