Invention Grant
- Patent Title: Photo-imprinting curable composition and pattern transferring method using the same
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Application No.: US16077265Application Date: 2017-04-25
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Publication No.: US11226553B2Publication Date: 2022-01-18
- Inventor: Takeshi Ibe , Makoto Yada
- Applicant: DIC Corporation
- Applicant Address: JP Tokyo
- Assignee: DIC Corporation
- Current Assignee: DIC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JPJP2016-095302 20160511
- International Application: PCT/JP2017/016300 WO 20170425
- International Announcement: WO2017/195586 WO 20171116
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C08F283/12 ; C08F2/48 ; C08L83/10 ; G03F7/027 ; G03F7/075 ; C08F299/08 ; C08L53/00 ; H01L21/027 ; C08F220/20 ; C08F212/14 ; C08F220/58 ; C08F226/02 ; C08G77/442 ; C08F222/38 ; C08F220/28

Abstract:
An object of the present invention is to provide an imprinting curable composition which includes a silicon-containing polymerizable compound such as polysiloxane, exhibits outstanding adhesion to a substrate and excellent demoldability from a fine pattern mold, and causes very little mold contamination. The object is attained by providing a photo-imprinting curable composition including a polymerizable compound (A) containing a silicon atom in the molecule, a photopolymerization initiator (B) and an additive (C), the additive (C) being a compound represented by the following formula (C1) or (C2): R1OC2H4OnX1 (C1) X2OC2H4OpC3H6OqC2H4OrX3 (C2) (In the formula (C1), R1 is a C12-30 alkyl group, X1 is a hydrogen atom or an acyl group, and n is an integer of 0 to 50. In the formula (C2), X2 and X3 are each independently a hydrogen atom or an acyl group, and p, q and r are each independently an integer of 1 to 50).
Public/Granted literature
- US20190041745A1 PHOTO-IMPRINTING CURABLE COMPOSITION AND PATTERN TRANSFERRING METHOD USING THE SAME Public/Granted day:2019-02-07
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